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Item NO.:
PL-01CLead Time:
7daysShipping Port:
XiaMen
PL-01C RF Plasma System
R&D plasma system for surface cleaning, surface activation and surface etching
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Product Introduction |
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Product Description |
Based on modified CCP technique, PL-01C is a R&D-oriented desktop-type plasma cleaner especially designed for the research of bio-materials, nano materials, microfluidics and so on. Unlike traditional parallel-type plasma cleaner, our plasma source delivers stronger plasma density under similar process condition. Stronger plasma density contributes to effective surface treatment (i.e. cleaning/modification) and surface etching. Please contact us for more information. |
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Product Features |
* Effective treatment – patented plasma delivers stronger plasma density, this enables effective surface cleaning, modification, etching and even ion implantation. * Controllability - programed sequences (i.e. pumping, venting and process setup) with graphical illustrations for easy, intuitive operation. * Traceability - system status is fully recorded for tracking and analysis. Alarm is provided to highlight abnormal situations for quick diagnosis and problem solving. |
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Product Application |
* Bio-material researches * Nano-material researches * 2D material researches * Microfluidics researches |
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Standard Specification |
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Size and weight |
* Dimension: 700mm (L) x 580mm (W) x 560mm (H) * Weight: approx. 40kg * Front-opening design for easy loading / unloading substrates and hardware maintenance |
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Plasma generator |
* Frequency: 13.56MHz * Power rating: 300W * Cooling: air-cooling |
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Plasma matching |
* Automatic matching network * Cooling: air-cooling |
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Plasma source |
* Modified CCP-type plasma with 4” dia. effective treatment area * Integrated with built-in gas inlet for O2 dosage via MFC |
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Gas flow control |
* MFC for O2 * Max flow rate: 50 sccm |
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Pumping / gauge units |
* Low vacuum range: ○ Pump type: rotary vane pump
○ Pumping capability: 250L/min, 50/60Hz
○ Gauge type: Pirani
○ Measuring range: 1x10E-4 ~ 1000 Torr\
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Control interface |
* 4” full-color touch-screen with preprogramed controlling sequences |
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Optional Items
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Bias mode |
* Via upper plasma plate |
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Gas ring |
* Introduce MFC-regulated gas between plasma plates |
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MFC for gas ring |
* Quantity: 1 ea * Please specify gas species and required flow rate |
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Additional gas inlet for plasma source |
* Introduce MFC-regulated gas from plasma source |
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MFC for additional plasma source gas inlet |
* Quantity: 1 ea * Please specify gas species and required flow rate |
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Precursor module |
* Quantity: 1 ea, including precursor container, heater and temperature controller. * This module will work with moving bench |
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Moving bench for precursor module |
* Quantity: 1 ea |
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MFC for precursor module |
* Quantity: 1 ea * Please specify gas species and required flow rate |
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Facilities |
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Electricity |
* AC220V, 15A, 50/60Hz * Supplied with 2-meter long power cable. Please locate PL-01C near plug |
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Grounding |
* Earth grounding resistance: <10 ohm * Connection: Copper mesh or 8mm square wire |
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Gas for venting system |
* Gas species: Nitrogen * Pressure: 3~5kg/cm2 * Connection: 1/4” Swagelock x 1ea |
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Gas for plasma treatment |
* Gas species: 5N O2 * Pressure: 2~3kg/cm2 , equivalent to 30psi * Connection: 1/4” Swagelock x 1ea |
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Exhaust |
* For rotary vane pump ○ Flow > 300L/min
○ Connection: NW25 x 1ea
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Cooling water |
* Water flow: > 20L/min * Water pressure: 2kg/cm2 * Water resistance: > 3 mega ohm * Water PH value: 7~8 * Water temperature: 20~25ºC * Water inlet connection: ¼” Swagelock x 1ea * Water outlet connection: ¼” Swagelock x 1ea |
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General Environment Requests |
* Clean room * Room temperature: 20ºC +/- 3ºC * Room moisture: 50% +/- 10% |
Ollital Technology would like to establish win-win business cooperation with distributors all over the world.
online service
+86 15960821529
kevin@ollital.comkevinollital@gmail.com
+86 15960821529
+8615960821529
